NOVELLUS CONCEPT ONE
PECVD
REFURBISHED
WAFER SIZE:200MM

Place ITEM 配置
System Power 3相5线 208V 150A
系统 DOS 6.22
wafer size 200mm
Front ctrl/Back switch
Loadlock Chamber Cassette Platform Two，Metal
MKS throttle valve and controller QTY：1
Wafer On Paddle sensor
ISO Valve QTY：1
N2 Filter
Process Chamber Heater block 200-420℃可调，偏差±3℃
Showerhead QTY：6
Throttle Valve QTY：1
ISO Valve QTY：1
Spindle
Manometer 10Torr
Gas Box A1:N2 5SLM 对应工艺气体：N2
A2:N2 1SLM 对应工艺气体：SIH4
A3:N2 2SLM 对应工艺气体：PH3
A4:N2 2SLM 对应工艺气体：B2H6
B1:N2 20SLM 对应工艺气体：N2O
B2:N2 10SLM 对应工艺气体：NH3
B3:N2 20SLM 对应工艺气体：C2F6
B4:N2 20SLM 对应工艺气体：O2
Purge N2
RF Gennrator HF 5000W
LF 1400W 400KHZ可调
HF Match

ITEM Hardware SPEC
1 LL chamber base pressure ＜50mTorr
2 LL chamber leak rate ≤25mTorr/min
3 Process chamber base pressure ＜15mTorr
4 Process chamber leak rate ≤10mTorr/min
5 Each Gas Line leak rate ≤2mTorr/min
6 MFC Accuracy Within ±3%
7 Temperature control 200-420℃可调，偏差±2℃
8 RF power Accuracy Within ±3%
9 Cycling run without Alarm 1000PCS
10 安全连锁 设备所有动作具备相应的安全连锁功能及电气连锁保护功能，工艺气体流量报警能直接终止程序作业
11 程序要求 工艺程序运行前要有管路吹扫，异常终止后要有管路吹扫功能
12 清扫要求 设备可根据淀积膜厚能自动计算CLEAN时间，且CLEAN次数可设定
13 工艺 Nitride、Oxide